Análisis espectroscópico de las películas delgadas de óxido de cobre y del plasma producido por deposición de láser pulsado

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Descripción: We use spectroscopic analysis to study plasma and copper thin films obtained by the Pulsed Laser De position technique. The Optical Emission Spectroscopy (OES) was implemented to analyse of emission spectra of the copper plasma produced by the laser Nd:YAG of 1064 nm, which makes the ablation on the copper target. The thin film is growing over an amorphous substrate (glass) at room temperature, and the pressure is changed from 1.2 to 26.6 Pa. We obtained lines of neutral copper Cu I and copper ion, with a meaning difference in intensities, what is related with a greater probability of emission in the green and with the color observed in the plasma during the ablation. The spectroscopic analysis of the thin films is made with Raman; we observed peaks corresponding to the copper oxide. By AFM we could determine the grain size and rough ness for thethin film at 20 Pa and at room temperature. The SEM analysis for different regions shows that the thin films are soft and smooth.
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: Jaime Andrés; Riascos Landázury Pérez Taborda, "Análisis espectroscópico de las películas delgadas de óxido de cobre y del plasma producido por deposición de láser pulsado", -:Revista Colombiana de Física; Vol. 45, No. 2, 2013. Consultado en línea en la Biblioteca Digital de Bogotá (https://www.bibliotecadigitaldebogota.gov.co/resources/2084759/), el día 2025-05-11.

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